发明名称 Target of intermetallic compound with B2-ordered lattice structure, production method thereof and magnetic recording medium having B2-structured underlayer
摘要 A target for sputter-depositing a B2-structured thin film for an underlayer of a magnetic recording medium. Since the target is made of a sintered body of an intermetallic compound being substantially a B2-ordered lattice structure, the target has a uniform small grain size and a high bending strength. The target produces a thin film with a small grain size and a minimized particle deposition.
申请公布号 US6159625(A) 申请公布日期 2000.12.12
申请号 US19980130167 申请日期 1998.08.06
申请人 HITACHI METALS LTD. 发明人 UENO, TOMONORI
分类号 C22C1/00;C22C1/04;C22C30/00;C23C14/34;G11B5/64;G11B5/66;G11B5/73;G11B5/738;(IPC1-7):G11B5/66 主分类号 C22C1/00
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