发明名称 |
Target of intermetallic compound with B2-ordered lattice structure, production method thereof and magnetic recording medium having B2-structured underlayer |
摘要 |
A target for sputter-depositing a B2-structured thin film for an underlayer of a magnetic recording medium. Since the target is made of a sintered body of an intermetallic compound being substantially a B2-ordered lattice structure, the target has a uniform small grain size and a high bending strength. The target produces a thin film with a small grain size and a minimized particle deposition.
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申请公布号 |
US6159625(A) |
申请公布日期 |
2000.12.12 |
申请号 |
US19980130167 |
申请日期 |
1998.08.06 |
申请人 |
HITACHI METALS LTD. |
发明人 |
UENO, TOMONORI |
分类号 |
C22C1/00;C22C1/04;C22C30/00;C23C14/34;G11B5/64;G11B5/66;G11B5/73;G11B5/738;(IPC1-7):G11B5/66 |
主分类号 |
C22C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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