| 摘要 |
<p>PROBLEM TO BE SOLVED: To form a smooth surface from which residual abrasive grains are removed without surface defects such as latent flaw, etching spot in the glass plishing surface by polishing the glass substrate, and then scrub-cleaning the polishing surface with suspension composed mainly of silicon dioxide particles. SOLUTION: By polishing using abrasive grains of cerium oxide, a glass substrate 3 is smoothed to have an average roughness (Ra) of about 0.3μm. Further, by the subsequent polishing using suspension of silicon dioxide particles (colloidal silica), super-smoothed to about 0.2μm. Subsequently, in scrub-cleaning using particles mainly composed of silica dioxide, a pad 2 is pressed to the polishing surface of the glass substrate 3, the periphery of which is supported by a carrier 9 between two pads, so that pressure is slightly applied thereto, whereby foreign matter remaining on the polishing surface is removed substantially without polishing. Further, scrub-cleaning is performed with an alkaline water solution with a pH of 8 or higher.</p> |
