发明名称 MICROWAVE ION SOURCE FOR OXYGEN-ION BEAM
摘要 PROBLEM TO BE SOLVED: To provide a long-life microwave ion source for oxygen-ion beam. SOLUTION: A plasma chamber is provided for generating plasma of gaseous oxygen and oxygen-ion beams are drawn out from plasma generated in the plasma chamber 110 by draw-out electrodes 130, 132, 134. Molybdenum is used as base materials 130A, 132A, 134A for the draw-out electrodes, and nickel or iridium is used as materials for surface thin films 130B, 132B, 134B thereof, Molybdenum is used as base materials 142A. 144A for support bases 142, 144, and nickel or iridium is used as materials for surface thin films 142B, 144B thereof.
申请公布号 JP2000340127(A) 申请公布日期 2000.12.08
申请号 JP19990146121 申请日期 1999.05.26
申请人 HITACHI LTD 发明人 TOKIKUCHI KATSUMI;SEKI TAKAYOSHI;BRENT ONEI
分类号 H01J27/16;H01J27/02;H01J27/18;H01J37/08;(IPC1-7):H01J27/16 主分类号 H01J27/16
代理机构 代理人
主权项
地址