发明名称 EPMA ANALYSIS METHOD USING MONTE CARLO SIMULATION
摘要 <p>PROBLEM TO BE SOLVED: To obtain an EPMA analysis method using Monte Carlo simulation that can accurately analyze thin-film and minute-object samples that are smaller than an X-ray generation region, and can accurately carry out analysis by simulation with a small number of electrons. SOLUTION: An X-ray absorption model where a sample in a rectangular parallelepiped shape is buried into a matrix that is sufficiently larger than an X-ray generation region while merely the upper surface is being exposed is supposed, size in the vertical, horizontal, and depth directions of the sample in the X-ray absorption model is set according to the size and shape, at the same time, J=11.5Z×10-3 [Kev] andΒ= 5.44Z2/3/E)×10-3 are used as ionized potential (Kev) and the constant of a screening parameter in each calculation expression of a scattering angle and the angle of rotation in the calculation expression, the energy loss of an electron, and a probability where the electron collides with an element, and the number of incident electrons is set to less than 1,000 for simulating.</p>
申请公布号 JP2000338065(A) 申请公布日期 2000.12.08
申请号 JP19990200737 申请日期 1999.07.14
申请人 NIPPON LIGHT METAL CO LTD 发明人 OSADA YOSHIO
分类号 G01N23/225;(IPC1-7):G01N23/225 主分类号 G01N23/225
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