发明名称 ELECTRO-OPTICAL DEVICE AND PREPARATION THEREOF
摘要 <p>PROBLEM TO BE SOLVED: To improve the effective aperture ratio by forming an offset region between channel and LDD regions, such that the LDD region of a drive TFT overlaps with a gate interconnection through a gate insulating film, and such that the LDD region of a pixel TFT does not overlap with the gate interconnection sandwiching the gate insulating film. SOLUTION: A drive circuit is provided with a p channel TFT(thin-film transistor) 301, and an n channel TFT 302 and 303, while a pixel section is provided with a pixel TFT 304 formed of an n channel TFT. The TFT 302 is provided with an LDD region 207, which is located between a channel forming region 204 and a drain region 206, and which overlaps with a gate interconnection sandwiching a gate insulating film. Furthermore, the TFT 304 is provided with regions 217 to 220 and an offset region 221, which do not overlap with the gate interconnection through via channel-forming regions 213 and 214, a source region 215, a drain region 216, and the gate insulating film.</p>
申请公布号 JP2000340798(A) 申请公布日期 2000.12.08
申请号 JP20000072631 申请日期 2000.03.15
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI
分类号 G02F1/136;G02F1/1368;G09F9/30;H01L21/20;H01L21/322;H01L21/336;H01L27/08;H01L27/32;H01L29/786;(IPC1-7):H01L29/786 主分类号 G02F1/136
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