发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING SAME, PRODUCTION OF RESIST PATTERN AND PRODUCTION OF PRINTED CIRCUIT BOARD
摘要 PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition excellent in resolution, adhesion of a thin line, low plating bath contamination, chemical resistance and flexibility, to obtain a photosensitive element and to produce a resist pattern. SOLUTION: The photosensitive resin composition contains (A) a polymer binder, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in one molecule, (C) a 2,4,5-triarylinnidazole dimer and (D) a sulfonium-boron salt compound. The photosensitive resin composition is applied on a support and dried to obtain the objective photosensitive element. The photosensitive element is laminated on a substrate for forming a circuit in such a way that the photosensitive resin composition layer adheres closely to the substrate and the layer is imagewise irradiated with active light. The exposed part is photoset and the unexposed part is removed by development to produce the objective resist pattern. The substrate for forming a circuit with the produced resist pattern is then etched or plated to produce the objective printed circuit board.
申请公布号 JP2000338659(A) 申请公布日期 2000.12.08
申请号 JP19990149011 申请日期 1999.05.28
申请人 HITACHI CHEM CO LTD 发明人 NATORI MICHIKO;HIDAKA TAKAHIRO
分类号 H05K3/06;C08L101/00;C08L101/16;G03F7/004;G03F7/027;G03F7/028;G03F7/032;H05K3/18 主分类号 H05K3/06
代理机构 代理人
主权项
地址