发明名称 |
Verfahren zum Reinigen eines einem Fremdstoff enthaltenden Gases |
摘要 |
The invention relates to a method for purifying a gas (G) which contains an impurity. In said method, the gas (G) is directed past a wall (32), whose temperature is lower than the gas, in such a way that the impurity condenses on said wall. In order to clean the condensed impurity easily from the wall in a method of this type, the gas which is to be purified is directed past a wall which is coated with a protective layer. The material of said protective layer has a melting temperature which is higher than the temperature of the wall.
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申请公布号 |
DE19925967(A1) |
申请公布日期 |
2000.12.07 |
申请号 |
DE19991025967 |
申请日期 |
1999.05.31 |
申请人 |
SIEMENS AG |
发明人 |
MEIER, HARTMUT;MUELLER, BERND |
分类号 |
B01D5/00;(IPC1-7):B01D5/00;H05K3/34 |
主分类号 |
B01D5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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