Method and apparatus for cleaning a semiconductor device

摘要

An apparatus (100) for manufacturing a semiconductor device by toning a thin film (Wb, We) on a substrate (W), comprises a cleaning process section for cleaning the substrate (W) using a cleaning solution and a drying process section for jetting compressed gas onto the cleaned substrate (W), thereby removing the cleaning solution on the substrate (W), wherein the cleaning process section includes a nozzle body (111a to 111c) for jetting the cleaning solution onto the substrate (W) under high pressure.