发明名称 COMPOSITE ELECTRICAL CONTACT STRUCTURE AND METHOD FOR MANUFACTURING THE SAME
摘要 An improved wear resistant bump contact is produced by the inclusion of small particles of hard materials in the conductive material of the contact bump, preferably by co-deposition at the time of electroplating of the bump bulk material. Desirable attributes of the small particles of hard material include small particle size, hardness greater than the hardness of the bulk material of the contact bump, compatibility with the plating conditions, and electrical conductivity. Nitride, borides, silicides, carbides are typical interstitial compounds suitable for use in satisfying these desirable attributes. In one preferred example, a nickel bulk material and silicon carbide particles are utilized. In one variation, the bump of metal-particle co-deposited material is coated by a thin cap layer of noble, non-oxidizing metal to prevent electrical erosion by arcing as contact is made and broken from the pad. Rhodium and ruthenium are suitable metals and can be electrodeposition over the composite bump structure.
申请公布号 EP1023743(A4) 申请公布日期 2000.12.06
申请号 EP19980934369 申请日期 1998.07.08
申请人 DYTAK CORPORATION 发明人 NANIS, LEONARD;KEUKELAAR, RONALD
分类号 H05K3/00;G01R1/067;G01R1/073;G01R3/00;H01L21/60;H01L21/66;H05K3/24;H05K3/40;H05K3/42 主分类号 H05K3/00
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