发明名称 PHOTOSENSITIVE COMPOSITION
摘要 <p>The invention relates to a radiation-sensitive mixture essentially comprising (a) a water-insoluble binder or binder mixture, and (b) a compound which forms a strong acid on irradiation, where component (a) is a phenolic resin all or some of whose phenolic hydroxyl groups have been replaced by groups (IA) or (IB) <IMAGE> in which R<1>, R<2> and R<3> are alkyl radicals, or R<1> together with R<2> forms a ring, and X is CH2, O, S, SO2 or NR<4>. This radiation-sensitive mixture is suitable for the production of relief structures.</p>
申请公布号 KR100270286(B1) 申请公布日期 2000.12.01
申请号 KR19930001055 申请日期 1993.01.28
申请人 BASF AKTIENGESELLSCHAFT 发明人 HROST, BINDER;DR. REINGOLD SCHWALM;DR. DIRK FUNHOFF
分类号 G03F7/004;C08L61/10;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
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