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发明名称
CHEMICAL MECHANICAL POLISHING APPARATUS
摘要
申请公布号
KR200202092(Y1)
申请公布日期
2000.12.01
申请号
KR19980012223U
申请日期
1998.07.06
申请人
HYUNDAI ELECTRONICS IND. CO., LTD
发明人
KANG, JOON MO
分类号
H01L21/304;(IPC1-7):H01L21/304
主分类号
H01L21/304
代理机构
代理人
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地址
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