发明名称 MASK HAVING ALIGNING MARK
摘要 PURPOSE: A mask having alignment mark is provided to prevent an error and a serious accident in manufacturing a mask and to intensify a reference of a source material in testing a mask, by setting a reference mask, and by overlapping masks excluding the reference mask with the reference mask. CONSTITUTION: A series of masks are respectively located in the lower portions of the first and left sides of a pattern formation region, to be included in the pattern formation region. An alignment mark has either one of a rectangular shape or rectangle inside a rectangle.
申请公布号 KR100271125(B1) 申请公布日期 2000.12.01
申请号 KR19960040122 申请日期 1996.09.16
申请人 KEC CORP. 发明人 YUN, IN SOO
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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