| 摘要 |
PURPOSE: A phase shift mask is to provide an excellent profile of a resist in performing an exposure process using a phase shift mask regarding a positive resist, by making a phase shift consecutively occur by a phase transition region. CONSTITUTION: A mask is composed of a light shielding layer including one or at least two light transmitting openings, formed on a transparent substrate. A phase non-shifting region is composed of the substrate of the transparent substrate exposed by the light shielding layer. A phase shifting region is composed of a bottom of an etched portion of the transparent substrate, formed near the phase shifting region. A phase transition region is formed between the phase non-shifting region and the phase shifting region, and is composed of an inclined sidewall portion between the surface of the transparent substrate and the bottom of the etched portion so that the phase of transmitting light varies consecutively.
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