FORMING METHOD OF DIELECTRIC

摘要

PURPOSE: A method for manufacturing a dielectric layer is provided to improve an operating characteristic and reliability, by reducing a leakage current and increasing electrostatic breakdown voltage. CONSTITUTION: A TiO2 dielectric layer is deposited. Simultaneously, impurities containing a strontium element of which electrovalence is low and ion radius is large, are implanted together with the TiO2 layer so that a dielectric layer having the ratio of Sr/Ti smaller than 1 on an interface is formed. Ti(OC3H7)4 is used as a source material in evaporating the TiO2 dielectric layer.