发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To form clear production control standard by quantifying the quality of a HSG(hemispherical grain) film, after HSG treatment. SOLUTION: A surface form of a substrate W after HSG treatment is image- sensed with an image sensing means 20, and image data are obtained. Gradation of pixels constituting the image is expressed completely in two colors with a image processing means 23. A pixel of one color is made to correspond to a part, where the substrate surface is protruded by the HSG treatment, and a pixel of the other color is made to correspond to a part, where the substrate surface is recessed by the HSG treatment. On the basis of the ratio of pixels corresponding to the part where the substrate surface is protruded by the HSG treatment to the pixels of the whole image, an estimating means 24 estimates the ratio of parts where the substrate surface is protruded by the HSG treatment to the whole surface of the substrate.
申请公布号 JP2000332215(A) 申请公布日期 2000.11.30
申请号 JP19990136813 申请日期 1999.05.18
申请人 KOKUSAI ELECTRIC CO LTD 发明人 TAKANO SATOSHI
分类号 G01B11/30;H01L21/8242;H01L27/108 主分类号 G01B11/30
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