| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged beam exposing device reducing an aberration and a distortion and eliminating an interference between a deflector and a stigmeter. SOLUTION: A reticle 2 surface is irradiated with an electron beam in a lighting optical system, and a pattern on the irradiated surface is focused on a wafer 3 with a reticule side lens 4 and a wafer side lens 5. A deflector 7 has a function deflecting an electron beam to focus a pattern image on the reticle 2 surface positioned apart from an optical axis on a wafer 3 surface apart from the optical axis. A dynamic focus coil 8 corrects a displacement of a focus caused by the deflection. A stigmeter 9 corrects a blur caused by the deflection. Limiting pole piece diameters and pole piece intervals of individual lenses in specified ranges reduces and aberration, does not degrade a telecentricity, and eliminates a locational interference between the deflector and the lenses.
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