发明名称 |
Source-Down-Leistungstransistor |
摘要 |
The invention relates to a source-down power transistor in which narrow trenches (11) are provided between a source column (9) and a drain column (10). Said trenches are filled with insulated polysilicon (14). Inversion channels form on the lateral walls of the trenches in the instance of a positive drain voltage and a positive gate voltage. A current that can be controlled by the gate voltage flows inside said inversion channels.
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申请公布号 |
DE19923522(A1) |
申请公布日期 |
2000.11.30 |
申请号 |
DE19991023522 |
申请日期 |
1999.05.21 |
申请人 |
SIEMENS AG |
发明人 |
TIHANYI, JENOE |
分类号 |
H01L21/336;H01L29/08;H01L29/417;H01L29/423;H01L29/78;(IPC1-7):H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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