发明名称 Source-Down-Leistungstransistor
摘要 The invention relates to a source-down power transistor in which narrow trenches (11) are provided between a source column (9) and a drain column (10). Said trenches are filled with insulated polysilicon (14). Inversion channels form on the lateral walls of the trenches in the instance of a positive drain voltage and a positive gate voltage. A current that can be controlled by the gate voltage flows inside said inversion channels.
申请公布号 DE19923522(A1) 申请公布日期 2000.11.30
申请号 DE19991023522 申请日期 1999.05.21
申请人 SIEMENS AG 发明人 TIHANYI, JENOE
分类号 H01L21/336;H01L29/08;H01L29/417;H01L29/423;H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L21/336
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