METHOD AND DEVICE FOR EXPOSURE DATA GENERATION AND RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To obtain a method for exposure data generation that increases the processing speed of the processing which generates exposure data obtained by removing overlap from hierarchically designed mask pattern data and that reduces a work area. SOLUTION: In the overlap pattern collection processing, a CPU 2 uses a hierarchical structure to handle an overlapping pattern in mask pattern data as one cluster and discriminates whether clusters of patterns are in the same type or not and collects plural clusters of patterns into a structure on the basis of the discrimination result. The CPU 2 removes overlap of patterns in the unit of hierarchies with respect to the newly collected structure, thus generating exposure data free from overlap of patterns.