发明名称 |
EXPOSURE SYSTEM AND METHOD OF MANUFACTURING DEVICE |
摘要 |
A projection optic system exposes a substrate with exposing radiation through a mask pattern. An exposure system comprises calibration means for calibrating the image-forming characteristic of the projection optic system, means for setting the calibration time interval of the image-forming characteristic based on exposure conditions, and means for controlling the calibration means based on the calibration time interval set by the setting means.
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申请公布号 |
WO0072365(A1) |
申请公布日期 |
2000.11.30 |
申请号 |
WO2000JP03218 |
申请日期 |
2000.05.19 |
申请人 |
NIKON CORPORATION;MUTO, TAKAKAZU;SEKI, MASAMI |
发明人 |
MUTO, TAKAKAZU;SEKI, MASAMI |
分类号 |
G03F7/20;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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