发明名称 METHOD FOR RECOVERING SUBSTRATE OF OPTICAL INFORMATION MEDIUM
摘要 <p>PROBLEM TO BE SOLVED: To easily and thoroughly remove a protective layer stuck on a substrate without leaving shavings, an abrasive material or the like. SOLUTION: A high-pressure flow of an aqueous working fluid containing an abrasive material is blown on a protective layer 6 on a substrate 1 or a swelling agent is previously impregnated into the protective layer 6 to swell the protective layer 6 and the high-pressure flow is blown on the swollen protective layer 6. The protective layer 6 is mechanically removed by the impact of the abrasive material and only the substrate 1 is recovered.</p>
申请公布号 JP2000331384(A) 申请公布日期 2000.11.30
申请号 JP19990139521 申请日期 1999.05.20
申请人 TAIYO YUDEN CO LTD 发明人 HAMADA EMIKO
分类号 G11B7/26;B29B17/02;(IPC1-7):G11B7/26 主分类号 G11B7/26
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