| 摘要 |
PROBLEM TO BE SOLVED: To effectively eliminate organic contamination adhering to the surface of an electronic material by mixing a reducing substance into ozone dissolving washing water when ozone dissolving washing water touches the electron material or immediately prior to or after it, if the electron material is to be washed with the ozone dissolving washing water. SOLUTION: When an electron material is to be washed with ozone dissolving washing water, a reducing substance is mixed into the ozone dissolving washing water when the ozone dissolving washing water touches the electron material or immediately prior to or after it. The dissolved ozone concentration of the ozone dissolving washing water is preferably 0.01 mg/l or higher and 0.1 mg/l or lower. An ozone generating device and an ozone dissolving device can be manufactured in combination, and the ozone dissolving washing water can be set to ozone dissolving washing water in which ozone is dissolved after adding such acids as sulfuric acid, hydrochloric acid, and carbonic acid to ultrapure water. Hydrogen gas can be preferably used especially, since it does not have risks of generating secondary contamination and has small load with respect to rinsing after washing as the reducing substance.
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