发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having low water absorptivity and high heat resistance. SOLUTION: This photosensitive resin composition comprises (1) a reaction product of an epoxyacrylate (a) obtained by reacting a bifunctional epoxy resin having a biphenyl skeleton with an acrylic acid; and a tetrabasic acid anhydride (b); and (2) an epoxy resin for blocking a carboxylic acid; and (3) a photopolymerization initiator thus permitting the obtained photosensitive resin composition to be high in sensitivity and good in developability and low in water absorptivity and superior in heat resistance. |
申请公布号 |
JP2000330275(A) |
申请公布日期 |
2000.11.30 |
申请号 |
JP19990138530 |
申请日期 |
1999.05.19 |
申请人 |
MITSUBISHI GAS CHEM CO INC |
发明人 |
ISHII KENJI;HAGIWARA ISAO;HARADA TORU;YOKOYAMA JUN |
分类号 |
G03F7/027;C08F2/44;C08F2/48;C08F299/02;C08G59/42;G03F7/004;G03F7/028;G03F7/40 |
主分类号 |
G03F7/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|