发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having low water absorptivity and high heat resistance. SOLUTION: This photosensitive resin composition comprises (1) a reaction product of an epoxyacrylate (a) obtained by reacting a bifunctional epoxy resin having a biphenyl skeleton with an acrylic acid; and a tetrabasic acid anhydride (b); and (2) an epoxy resin for blocking a carboxylic acid; and (3) a photopolymerization initiator thus permitting the obtained photosensitive resin composition to be high in sensitivity and good in developability and low in water absorptivity and superior in heat resistance.
申请公布号 JP2000330275(A) 申请公布日期 2000.11.30
申请号 JP19990138530 申请日期 1999.05.19
申请人 MITSUBISHI GAS CHEM CO INC 发明人 ISHII KENJI;HAGIWARA ISAO;HARADA TORU;YOKOYAMA JUN
分类号 G03F7/027;C08F2/44;C08F2/48;C08F299/02;C08G59/42;G03F7/004;G03F7/028;G03F7/40 主分类号 G03F7/027
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