发明名称 DEVICE AND METHOD FOR TREATING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To quickly execute a treatment such as the removal of organic matters with ozone-containing water, etc. SOLUTION: Pure water or ozone-containing water flowing through a circulating pipeline L1 is cooled by means of a chiller 8. The ozone-containing water is produced by dissolving ozone gas in the cooled pure water or ozone-containing water by means of an ozone gas dissolving section 10 and supplied to a cleaning both 2. The ozone-containing water stored in the tank 2 is heated with a heater 6 and a plurality of substrates W is dipped in the heated ozone-containing water.
申请公布号 JP2000331979(A) 申请公布日期 2000.11.30
申请号 JP19990142334 申请日期 1999.05.21
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 FUJIKAWA KAZUNORI
分类号 H01L21/304;B01F1/00;(IPC1-7):H01L21/304 主分类号 H01L21/304
代理机构 代理人
主权项
地址