发明名称 |
DEVICE AND METHOD FOR TREATING SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To quickly execute a treatment such as the removal of organic matters with ozone-containing water, etc. SOLUTION: Pure water or ozone-containing water flowing through a circulating pipeline L1 is cooled by means of a chiller 8. The ozone-containing water is produced by dissolving ozone gas in the cooled pure water or ozone-containing water by means of an ozone gas dissolving section 10 and supplied to a cleaning both 2. The ozone-containing water stored in the tank 2 is heated with a heater 6 and a plurality of substrates W is dipped in the heated ozone-containing water.
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申请公布号 |
JP2000331979(A) |
申请公布日期 |
2000.11.30 |
申请号 |
JP19990142334 |
申请日期 |
1999.05.21 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
FUJIKAWA KAZUNORI |
分类号 |
H01L21/304;B01F1/00;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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