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发明名称
Verfahren zum Zurückpolieren einer Wolframschicht auf einem Halbleiter-Wafer
摘要
申请公布号
DE4124411(C2)
申请公布日期
2000.11.30
申请号
DE19914124411
申请日期
1991.07.23
申请人
MICRON TECHNOLOGY, INC.
发明人
DOAN, TRUNG TRI
分类号
H01L21/28;C23F1/38;C23F3/00;H01L21/304;H01L21/306;H01L21/308;H01L21/321;(IPC1-7):H01L21/302;B24B37/04;H01L21/283;H01L21/768
主分类号
H01L21/28
代理机构
代理人
主权项
地址
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Compositions
Spring steel strip
Antifouling window
Side protection system
Apparatus for overboarding a pipe
Electrical machine
Fixed offshore platform structures
Display or partitioning assembly
Air freshener device
Compounds
Surge inhibitor
Track maintenance machine
