ELECTROSTATIC CHUCK AND TREATING DEVICE

摘要

An electrostatic chuck for insulating substrate attraction, comprising a dielectric substrate (1a) acting on one surface thereof as an attraction surface of an insulating substrate and provided on the other surface with a plurality of electrodes (7) in order to electrostatic-attracting an insulating substrate such as a glass substrate, an insulating support base (1b) for fixing the dielectric substrate, a plurality of conducting terminals provided on the insulating support base, and a means for electrically connecting the electrodes with the conducting terminals, wherein a resistivity at room temperature of the dielectric substrate is up to 10<13> OMEGA cm, a thickness of the dielectric substrate up to 2 mm, a width of an electrode up to 4 mm, and an interval between electrodes up to 2 mm. A heating/cooling plate (6), a gas supply piping for supplying gas to a gap between the insulating substrate and the attraction surface, and a temperature control system for controlling the temperature of the insulating substrate are added to the above electrostatic chuck for insulating substrate attraction to constitute an insulating substrate treating device.