发明名称 FORMATION OF CONDUCTOR PATTERN
摘要 PROBLEM TO BE SOLVED: To improve use efficiency of paste since paste applied to a part excepting a conductor pattern is removed by developer in a conductor pattern formation method by photosensitive conductor paste. SOLUTION: In a conductor pattern formation method wherein photosensitive conductor paste is used, after a pattern which is larger than a desired pattern is formed by partially applying photosensitive conductor paste on a substrate wherein a pattern is formed, exposure and development are carried out by using a photomask of a desired pattern and a desired pattern is formed.
申请公布号 JP2000332379(A) 申请公布日期 2000.11.30
申请号 JP19990139546 申请日期 1999.05.20
申请人 TORAY IND INC 发明人 MATSUMURA NOBUO;KAMIOKA TAKENORI
分类号 H05K3/02;G03F7/004;H01B1/22 主分类号 H05K3/02
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