| 摘要 |
PROBLEM TO BE SOLVED: To realize a speedy and accurate pattern measuring method superior in measurement reproducibility. SOLUTION: A magnified image of a circuit pattern formed on a base plate 40 is formed on a solid imaging element 30 by a magnifying optical system constituted of an object optical system 22, a mirror 24 and an imaging optical system 26A. The position of the measuring object point of the circuit pattern in the field of view of the magnifying optical system is processed with an image processor 32 and the information concerning the position of the measuring object point in the view field is output to a control circuit 34. The control circuit 34 determines the position of the measuring object point based on this information and the position information of the moving stage 50 output from an interferometer system 14 and 16. At this moment, the position shift against the coordinate value of design of each measuring object point is obtained in advance and the position shift is added to the coordinate value of the design to drive a moving stage 50. By this, the measuring object point can be positioned at nearly the center of the field of view of the magnified optical system. |
