Laser irradiation apparatus and method of fabrication a semiconductor device

摘要

ÄObjectÜ An object is to obtain an even energy distribution of a laser beam in one direction, thereby conducting a uniform laser annealing on a film. ÄSolving MeansÜ A laser irradiation apparatus comprising: a lens for dividing a laser beam in one direction; and an optical system for overlapping the divided laser beam, characterized in that the shape of the laser beam entering into the lens has edges vertical to the above-mentioned direction.