发明名称 Plasma gas processing
摘要 <p>A plasma enhanced gas reactor including a reaction chamber having a pair of field-enhancing electrodes each of which has an axial passage through it by one of which a reactant gas is admitted to the reaction chamber, and by the other of which reaction products are removed from the reaction chamber. <IMAGE> <IMAGE> <IMAGE></p>
申请公布号 GB2319941(B) 申请公布日期 2000.11.29
申请号 GB19970023249 申请日期 1997.11.05
申请人 * AEA TECHNOLOGY PLC 发明人 ROBERT FREW * GILLESPIE;STEPHEN IVOR * HALL;DAVID * RAYBONE;FIONA * WINTERBOTTOM
分类号 B01D53/32;B01J12/00;B01J19/08;B01J19/12;H05H1/24;(IPC1-7):H01J37/32;H05H1/46 主分类号 B01D53/32
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