发明名称 PHOTOMASK PROVIDED WITH AN ESD-PRECLUDING ENVELOPE
摘要 A photomask (1) comprises a transmissive base plate (2), a first side of which is provided with a layer of a metallic mask material (4). In this layer, a mask pattern (6) is formed which is enclosed in an outer region (5) of mask material. The photomask is encapsulated in a protection layer (9) of transmissive and conductive material, which, on the first side of the base plate, is formed at such a distance from said first side that said protection layer remains free of the mask pattern.The photomask is thus protected against electrostatic discharges which could damage the mask pattern, and the projection of the mask pattern is not adversely affected.
申请公布号 EP1055154(A1) 申请公布日期 2000.11.29
申请号 EP19990973433 申请日期 1999.11.26
申请人 KONINKLIJKE PHILIPS ELECTRONICS N.V. 发明人 GEMMINK, JAN, W.;VAN HASSELT, KEES
分类号 G03F1/40;G03F1/64;G03F7/20;H01L21/027;(IPC1-7):G03F1/14 主分类号 G03F1/40
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