发明名称 Metal rinsing process with controlled metal microcorrosion reduction
摘要 Process for rinsing a metallized substrate subject to metal microcorrosion using an acidic aqueous rinsing solution wherein the rinsing solution comprises at least one strong inorganic acid in an amount enough to reduce the alkalinity of the rinse solution to a level low enough to reduce microcorrosion of the said metal layer while rinsing.
申请公布号 US6153018(A) 申请公布日期 2000.11.28
申请号 US19970987261 申请日期 1997.12.09
申请人 INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM 发明人 ROTONDARO, ANTONIO L. P.;VOS, RITA;HEYNS, MARK
分类号 G03F7/42;H01L21/02;H01L21/311;H01L21/3213;(IPC1-7):B08B3/08;C23G1/02;G03C5/00 主分类号 G03F7/42
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