发明名称 FLATENING METHOD AND APPARATUS FOR SEMICONDUCTOR BOARD
摘要 PROBLEM TO BE SOLVED: To surely adsorb and separate a workpiece while keeping high uniformity in working by adding the pressure of the first fluid in an elastic bag to a semiconductor board, and sucking and retaining the semiconductor board by the second fluid in a fluid passage formed on a part opposite to the semiconductor board, of the bag. SOLUTION: In an apparatus where a wafer 1 is adsorbed and retained by a wafer retaining holder 3 and pressed to a grinding stone surface plate 20 to be ground, the wafer retaining holder 3 comprises a bag 22 made of a thin elastic body on a part of a holder board 21 to be rotated and driven, and the wafer 1 is statically pressed to the grinding stone surface plate 20 by the pressure of the air 23 supplied from the external. A flexible suction pipe 24 is penetrated inside of the bag 22, and its lower end part is opened at a position to be contacted with the wafer 1 at a lower surface of the bag 22 to be used as a suction nozzle 25, and the other end is connected to a suction source 26. Whereby the wafer 1 is surely adsorbed, and the error such as the separation of the wafer during the conveying of the wafer can be prevented.
申请公布号 JP2000326219(A) 申请公布日期 2000.11.28
申请号 JP19990133723 申请日期 1999.05.14
申请人 HITACHI LTD 发明人 MORIYAMA SHIGEO;KUGAYA TAKASHI;FURUKAWA TAKAYASU;KATAGIRI SOUICHI;KAWAMURA YOSHIO;SATO MASAHIKO
分类号 B24B37/30;H01L21/304 主分类号 B24B37/30
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