| 摘要 |
<p>PROBLEM TO BE SOLVED: To obtain a substrate having smooth surface free from projection due to remaining of an abrasive material and enabling low flowing amount of a head by subjecting a glass substrate to finish polishing by a soft elastic polisher while feeding a polishing agent obtained by mixing a polishing solution which chemically etches or polishes with abrasive grain. SOLUTION: A solution for chemically etching a material to be processed (glass substrate), e.g. an aqueous solution of hydrofluoric acid, an aqueous solution of hydrosilicofluoric acid, mixed solution, etc., of alkalis is used as the polishing solution and is used. For example, zirconium oxide, alumina, chromium oxide, zirconium oxide, titanium oxide, etc., is used as the abrasive grain. The finish polishing is effective not only to substrate for information recording media after carrying out low-temperature type ion exchange treatment, but also to a substrate before carrying out ion exchange treatment. For example, artificial leather suede is used as the soft elastic polisher. The target can be attained even when the thickness removed by finish polishing is <=100Åper one side of the substrate.</p> |
