| 摘要 |
PROBLEM TO BE SOLVED: To obtain a radiation-sensitive resin composition which has high rubbing resistance, high-temperature dimensional stability and compression strength by compounding a copolymer formed from an unsaturated carboxylic acid and/or its anhydride, an unsaturated epoxy compound and other olefinic unsaturated compounds with a 1,2-quinonediazide compound. SOLUTION: This composition is prepared by compounding 100 pts.wt. copolymer formed from 5-40 wt.% unsaturated carboxylic acid and/or its anhydride, 10-70 wt.% unsaturated epoxy compound and 10-70 wt.% olefinic unsaturated compounds other than the foregoing compounds with 5-100 pts.wt. 1,2- quinonediazide compound (e.g. 1,2-naphthoquinonediazide sulfonic acid ester). The composition is suitable for forming a color filter protection film or a TFT interlayer insulation film having a column-like spacer for gap controlling. |
