| 摘要 |
A scanning exposure method is arranged to illuminate a mask with light pulses and to synchronously scan the mask and a photosensitive substrate so as to effect scanning exposure of a pattern image of the mask on the photosensitive substrate, and includes detecting energy amounts of light pulses illuminating the mask during the scanning exposure, successively calculating an integrated amount of light of the last N pulses (N is an integer more than one) for every unit pulse number, based on the energy amounts thus detected and adjusting an exposure dose on the photosensitive substrate in accordance with a sequence of integrated amounts of light thus calculated.
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