METHOD FOR FORMING AND APPLYING ANTI-REFLECTIVE COATING USING HYDROCARBON GAS

摘要

PURPOSE: A method for forming and applying an anti-reflective coating(ARC) using a hydrocarbon gas is provided to improve an etching selectivity and to reduce a cost, by using only a hydrocarbon gas while excluding a helium gas used as a carrier gas in a plasma enhanced chemical vapor deposition(PECVD) chamber, and by forming the ARC while controlling a temperature at upper and lower parts of a substrate in the chamber. CONSTITUTION: A high reflection layer is formed on a semiconductor substrate(100). An anti-reflective coating(ARC)(106) is formed on the high reflection layer(104) by using a hydrocarbon gas only. A photoresist pattern(108) is formed on the ARC.