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发明名称
METHOD AND APPARATUS OF HIGH-TEMPERATURE HIGH-PRESSURE TREATMENT FOR SEMICONDUCTOR WAFER
摘要
申请公布号
KR20000071397(A)
申请公布日期
2000.11.25
申请号
KR1020000010331
申请日期
2000.03.02
申请人
发明人
分类号
主分类号
代理机构
代理人
主权项
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