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发明名称
METHOD AND APPARATUS FOR DEPOSITING A PLANARIZED DIELECTRIC LAYER ON A SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
KR20000068308(A)
申请公布日期
2000.11.25
申请号
KR19997001460
申请日期
1999.02.24
申请人
트리콘 이큅먼츠 리미티드
发明人
비크만,너트;키에르마스즈,아드리안;맥레치에,시몬;테일러,마크필립;팀스,피터레슬리
分类号
H01L21/31;H01L21/312;H01L21/316;H01L21/768
主分类号
H01L21/31
代理机构
代理人
主权项
地址
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