| 摘要 |
PURPOSE: An exposure device for a photo etching process is provided to easily set optimal light source condition without complication. CONSTITUTION: An exposure device for a photo etching process includes an illumination sensing part(10) equally divided into a plurality of areas, and a light source setting control part(12) automatically setting the position of a light source by a signal input from the illumination sensing part, wherein the illumination sensing part includes a signal converting part converting an optical signal into an electric signal for transmitting the converted signal to the light source setting control part, and the signal converting part formed with a photomultiplier converting the optical signal into the electric signal, and an electric signal pre amplifier amplifying the electric signal. |
