发明名称 SUBSTRATE FOR IMPURITY ANALYSIS, AND THE IMPURITY ANALYSIS
摘要 PROBLEM TO BE SOLVED: To reduce a leaving time of a substrate for impurity analysis at analyzing of impurities in the air inside a clean room. SOLUTION: In a substrate 1 for impurity analysis, on which impurities of an inorganic or organic type in the air of a clean room are adsorbed, a main surface 2 to be used as an impurity adsorbing surface is formed by etching or the like into a rough surface 3. Thereby an effective adsorption area of the major surface 2 is increased, and impurity sampling efficiency is improved. As a result, the time during which the substrate 1 is left standing in the clean room air can be reduced, and an impurity analysis efficiency can be improved.
申请公布号 JP2000323545(A) 申请公布日期 2000.11.24
申请号 JP19990126885 申请日期 1999.05.07
申请人 MITSUBISHI ELECTRIC CORP 发明人 HAMA MASAHARU;NAKANO TOSHINORI
分类号 H01L21/66;(IPC1-7):H01L21/66 主分类号 H01L21/66
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