发明名称 APPARATUS FOR POSITIONING, PATTERN INFORMATION MEASURING APPARATUS AND METHOD FOR POSITIONING
摘要 <p>PROBLEM TO BE SOLVED: To improve a positioning accuracy in the case of positioning a sample at a predetermined position of a sample base without cost. SOLUTION: The apparatus 1000 for positioning comprises a sample profile detecting means 20 for detecting a profile of a sample 3 placed on a sample base 3, a positional deviation amount calculating means 22 for calculating a positional deviation amount of the sample 3 to a predetermined position of the base 4 based on a detected result of the means 20, a lifting mechanism 2 for lifting the sample 3 from the base 4 in response to the deviation amount, and a drive means 5 for driving the base 4. The means 5 drives the sample 4 based on the deviation amount while the sample 3 is lifted from the base 4 by the mechanism 2.</p>
申请公布号 JP2000321043(A) 申请公布日期 2000.11.24
申请号 JP19990135161 申请日期 1999.05.17
申请人 NIKON CORP 发明人 IWASAKI MASAYA
分类号 B23Q3/18;G01B11/00;G01B21/00;H01L21/027;H01L21/68;(IPC1-7):G01B21/00 主分类号 B23Q3/18
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