发明名称 SYSTEM AND METHOD FOR AUTOMATICALLY ANALYZING DEFECT MATERIAL ON SEMICONDUCTOR
摘要 <p>PROBLEM TO BE SOLVED: To appropriately fix the material composition of a defect by utilizing each material library of defect and background and automatically separating the defect spectrum from the background. SOLUTION: The system is provided with a defect material library 200 and a background library 210 in a memory 190. By utilizing both the libraries, a processor 180 automatically separates the defect spectrum from the background and appropriately identifies the material composition of the defect. More specifically, the processor 180 where X rays being discharged from a sample 150 are applied obtains each spectrum of the object and background from both the libraries 200 and 210 and counts the spectra corresponding to elements that exist in each. Then, each element in the spectrum count of the object is compared with an element list in the defect material library 200, and the object is defined as a hetero object when elements for counting object spectra exist in the element list.</p>
申请公布号 JP2000321225(A) 申请公布日期 2000.11.24
申请号 JP20000046227 申请日期 2000.02.23
申请人 APPLIED MATERIALS INC 发明人 NOOMU DOTAN;ALEXANDER KHADZHIEVICH
分类号 G01N23/225;G01N23/20;H01L21/66;(IPC1-7):G01N23/225 主分类号 G01N23/225
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