发明名称 SAMPLE POSITION CORRECTION METHOD IN ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To maximize sample moving distance in a range capable of performing image process and to improve throughput by optimizing a corrective interval so as to decrease the corrective interval, by detecting positional displacement of a sample and optimizing the corrective interval of sample position correction performed during a sample movement based on a correcting history so that the sample is always positioned at the center of an image display device. SOLUTION: A sample stage comprises a tilting direction driving mechanism 7, a rotation direction driving mechanism 6, and a horizontal direction driving mechanism 5. An image processing device 4 detects, using a secondary electron detector 3, secondary electrons generated when an electron beam emitted from an electron source 2 is radiated to a sample 1, and images them as sample surface information. Using an image representing this sample surface information, an image position-detecting device 10 detects a sample position. Displacement of an observed image is calculated based on the detected position information to control the stage by a control system 9 so that the observed object is always placed at the center of an image display device 8.
申请公布号 JP2000323080(A) 申请公布日期 2000.11.24
申请号 JP19990129578 申请日期 1999.05.11
申请人 HITACHI LTD 发明人 HIRAI TOMOHIRO
分类号 H01J37/20;H01J37/22;(IPC1-7):H01J37/20 主分类号 H01J37/20
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