PRODUCTION OF RESIST PATTERN, FORMATION OF BARRIER RIB OF PLASMA DISPLAY PANEL AND PRODUCTION OF PLASMA DISPLAY PANEL

摘要

PROBLEM TO BE SOLVED: To simultaneously prevent the thinning of the resist line of an upper layer and the insufficient curing of a lower layer and to produce a resist pattern with an opening whose top width is slightly smaller than the bottom width and a linear oblique side. SOLUTION: At least two photosensitive resin composition layers are laminated on a substrate and imagewise irradiated with active light. The exposed part is photoset and the unexposed part is removed by development to produce the objective resist pattern. The maximum value of absorbance of the photosensitive resin composition layer situated farthest from the substrate in the wavelength range of 300-420 nm of UV is 0.3-1.5.