| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method, for the evaluation of the water quality of ultrapure water, in which a metal element contained in the ultrapure water can be analyzed simply, with good reproducibility and precisely. SOLUTION: In this apparatus, ultrapure water is brought continuously into contact with a silicon substrate 5. The apparatus is composed of a container in which an ultrapure-water supply port 1, a discharge port and a silicon- substrate mounting part are provided. The silicon substrate 5 can be mounted in the container, and it can be separated and removed to the outside of the container. In addition, the silicon substrate 5 which is cleaned is mounted in the container in which the ultrapure-water supply port 1, the discharge port and the silicon-substrate mounting part are provided. The ultarpure water is supplied continuously. The ultrapure water is brought into contact with the silicon substrate 5. After that, the silicon substrate 5 is taken out. A metal element which is stuck to the surface of the silicon substrate is analyzed.
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