发明名称 ANTIPERSPIRANT AND DEODORANT COMPOSITIONS CONTAINING CYCLOHEXASILOXANE
摘要 <p>Disclosed are antiperspirant and deodorant compositions having improved stability, low residue performance and/or improved cosmetics. These compositions comprise select concentrations of cyclohexasiloxane as a volatile silicone material, from about 0.1 % to about 50 % by weight of an antiperspirant active, and from about 0.1 % to about 50 % by weight of a suspending agent, wherein the compositions are preferably substantially free of cyclotetrasiloxane. The selection of cyclohexasiloxane over other volatile silicone materials provides improved low residue performance, and especially when formulated as an aqueous emulsion it provides improved product stability in the form of extended duration of time within which the emulsion remains cleary or nearly so.</p>
申请公布号 WO2000069402(A1) 申请公布日期 2000.11.23
申请号 US2000012154 申请日期 2000.05.04
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