| 摘要 |
<p>The present invention provides a manufacturing environment (210) for a wafer fab, and an SPDA data environment (212) for acquiring processing parameters and metrology data of production runs. A computation environment (214) processes the SPDA data to prepare delta graphs (536, 540 and 542) of the present invention. These delta graphs are then analyzed in an analysis environment (216). An MES environment (218) evaluates the analysis and executes a process intervention if the results of the analysis indicate processing or product quality problems in the process run of the manufacturing environment (210). Additionally, the invention provides for SPDA delta graphs of SPC control charts as well as SPC techniques utilizing process control limits based on delta graphs to identify, analyze and trouble-shoot semiconductor processing problems, in order to improve equipment reliability and wafer yield. The present invention also provides a process (700) for computer integrated equipment time states including a service procedures module (755) linked to preventive maintenance time states (735 and 742) and to a repair time state (731).</p> |
