LOW-TEMPERATURE COMPATIBLE WIDE-PRESSURE-RANGE PLASMA FLOW DEVICE

摘要

A plasma reactor having a housing (30) that contains conductive electrodes (14, 16) with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and a substrate (24) is placed in the gas flow downstream of the electrodes, such that said substrate is substantially uniformly contacted across a large surface area with the reactive gases emanating thereform. The invention is also embodied in a plasma reactor having a housing (30) that contains conductive electrodes (14, 16) with openings to allow gas to flow through or around them, where one or more of the electrodes are powered by an RF source and one or more are grounded, and one of the grounded electrodes contains a means of mixing in other chemical precursors to combine with the plasma stream, and a substrate (24) placed in the gas flow downstream of the electrodes, such that said substrate is contacted by the reactive gases emanating thereform.