发明名称 |
METHOD AND DEVICE FOR EXTRACTION OF ELECTRODES IN A VACUUM AND EMISSION CATHODES FOR SAID DEVICE |
摘要 |
The inventive method for extracting electrons in a vacuum consists in the following: creation of a cathode which comprises at least one junction (9) between a metal (7) which is used as an electron reservoir and an n-type semiconductor (8), possessing a surface potential barrier which has a height which is measured in tenths of electron volts and having a thickness ranging from 1-20 nm; the electrons are injected via the metal-semiconductor junction (9) in order to create a charge which has enough space to reduce the semiconductor surface potential barrier to a value which is lower than or equal to 1 eV in relation to the Fermi level of the metal (7); the height of the n-type semiconductor surface potential barrier (Vp) is controlled with the aid of the polarization source creating an electric field in a vacuum in order to regulate emission of the electron flow to the anode. |
申请公布号 |
WO0070638(A1) |
申请公布日期 |
2000.11.23 |
申请号 |
WO2000FR01297 |
申请日期 |
2000.05.12 |
申请人 |
UNIVERSITE CLAUDE BERNARD LYON I;VU THIEN, BINH;DUPIN, JEAN-PIERRE;THEVENARD, PAUL |
发明人 |
VU THIEN, BINH;DUPIN, JEAN-PIERRE;THEVENARD, PAUL |
分类号 |
H01J9/02;H01J1/308;H01J29/04;(IPC1-7):H01J1/30 |
主分类号 |
H01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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