发明名称 COPPER REPLENISHMENT TECHNIQUE FOR PRECISION COPPER PLATING SYSTEM
摘要 A copper replenishment system (10) is designed for replenishing copper which is depleted from a coppet plating solution (15). The replenishment is achieved by the use of a compact filter cartridge (30), which is inserted into a recirculating loop (12) for the solution. The filter cartridge (30) contains a chemical, which when reacting with the solution, replenishes the copper into the solution. The filter cartridge (30) is a compact unit which can be easily handled and reduces the amount of contaminants that could be introduced by the presence of the replenishment chemical.
申请公布号 WO0068468(A1) 申请公布日期 2000.11.16
申请号 WO1999US10193 申请日期 1999.05.10
申请人 CUTEK RESEARCH, INC. 发明人 TING, CHIU, H.;CHO, PETER;LIN, FRANK;ANDRYUSHCHENKO, TANYA
分类号 C25D21/18;(IPC1-7):C25D21/18 主分类号 C25D21/18
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