发明名称 |
COPPER REPLENISHMENT TECHNIQUE FOR PRECISION COPPER PLATING SYSTEM |
摘要 |
A copper replenishment system (10) is designed for replenishing copper which is depleted from a coppet plating solution (15). The replenishment is achieved by the use of a compact filter cartridge (30), which is inserted into a recirculating loop (12) for the solution. The filter cartridge (30) contains a chemical, which when reacting with the solution, replenishes the copper into the solution. The filter cartridge (30) is a compact unit which can be easily handled and reduces the amount of contaminants that could be introduced by the presence of the replenishment chemical.
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申请公布号 |
WO0068468(A1) |
申请公布日期 |
2000.11.16 |
申请号 |
WO1999US10193 |
申请日期 |
1999.05.10 |
申请人 |
CUTEK RESEARCH, INC. |
发明人 |
TING, CHIU, H.;CHO, PETER;LIN, FRANK;ANDRYUSHCHENKO, TANYA |
分类号 |
C25D21/18;(IPC1-7):C25D21/18 |
主分类号 |
C25D21/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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